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07.06.2005 - Intel and Corning Enter Joint Development Agreement for Extreme Ultraviolet Photomask Substrates



View Intel-Press related news. CORNING, N.Y., July 6, 2005 €“ Intel Corporation and Corning Incorporated (NYSE:GLW) have entered into an agreement to develop ultra low thermal expansion ULE® glass photomask substrates required for Extreme Ultraviolet (EUV) lithography technology. These substrates are needed to develop low defect EUV photomasks to enable 32nm node high-volume production using EUV lithography.

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NID: 7401 / Submitted by: The Spirit of Zuron
Categories: Press Release
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